Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F19%3A43953478" target="_blank" >RIV/49777513:23520/19:43953478 - isvavai.cz</a>

Výsledek na webu

<a href="http://doi.org/10.1088/1361-6463/aae9c6" target="_blank" >http://doi.org/10.1088/1361-6463/aae9c6</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6463/aae9c6" target="_blank" >10.1088/1361-6463/aae9c6</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS

Popis výsledku v původním jazyce

The ion-flux characteristics at a substrate position and the corresponding discharge characteristics were investigated during controlled low-temperature (300 °C) reactive HiPIMS depositions of thermochromic VO2 films onto conventional soda-lime glass substrates without any substrate bias voltage and without any interlayer. It was shown that the phase composition of the films correlates with the (V+ + V2+) ion fraction and the (V+ + V2+):(2O2+ + O+) ion ratio in the total ion flux onto the substrate. Setting the amount of oxygen in the gas mixture allowed us to control not only the phase composition of the films but also their crystallinity. It was found that an appropriate composition of the total ion flux and high ion energies (up to 50 eV relative to ground potential) support the crystallization of the thermochromic phase in the VO2 films. We achieved a high modulation of the transmittance at 2500 nm (between 51% and 8%) and of the electrical resistivity (changed 350 times) for a 88 nm thick VO2 film.

Název v anglickém jazyce

Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS

Popis výsledku anglicky

The ion-flux characteristics at a substrate position and the corresponding discharge characteristics were investigated during controlled low-temperature (300 °C) reactive HiPIMS depositions of thermochromic VO2 films onto conventional soda-lime glass substrates without any substrate bias voltage and without any interlayer. It was shown that the phase composition of the films correlates with the (V+ + V2+) ion fraction and the (V+ + V2+):(2O2+ + O+) ion ratio in the total ion flux onto the substrate. Setting the amount of oxygen in the gas mixture allowed us to control not only the phase composition of the films but also their crystallinity. It was found that an appropriate composition of the total ion flux and high ion energies (up to 50 eV relative to ground potential) support the crystallization of the thermochromic phase in the VO2 films. We achieved a high modulation of the transmittance at 2500 nm (between 51% and 8%) and of the electrical resistivity (changed 350 times) for a 88 nm thick VO2 film.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostrukturní povlaky syntetizované užitím vysoce reaktivního pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

JOURNAL OF PHYSICS D-APPLIED PHYSICS

ISSN

0022-3727

e-ISSN

—

Svazek periodika

52

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

9

Strana od-do

„025205-1“-„025205-9“

Kód UT WoS článku

000449372400002

EID výsledku v databázi Scopus

2-s2.0-85056719206