<<A>> perspective of magnetron sputtering in surface engineering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00039226" target="_blank" >RIV/49777513:23520/99:00039226 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/99:02000093

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

<<A>> perspective of magnetron sputtering in surface engineering

Popis výsledku v původním jazyce

Magnetron sputtering is a very powerful process which is now currently and successfully used in many applications, particularly in microelectronic and surface engineering, for the production of films and coatings. Magnetron technology is, however, continuously developing because new advanced films with prescribed physical and functional properties are needed. This paper reports on duplex coatings, nanocomposite coatings, high-rate magnetron sputtering and self-sputtering, i.e. new advances in magnetronsputtering technology which are of great importance for future development of surface engineering. A great deal of attention is devoted to (i) the coating/substrate interface, (ii) the magnetron sputtering of nanostructured coatings with new properties due to small grains of about 10 nm and smaller and (iii) the replacement of ecologically damaging galvanic coating processes by high-rate magnetron sputtering and self sputtering.

Název v anglickém jazyce

<<A>> perspective of magnetron sputtering in surface engineering

Popis výsledku anglicky

Magnetron sputtering is a very powerful process which is now currently and successfully used in many applications, particularly in microelectronic and surface engineering, for the production of films and coatings. Magnetron technology is, however, continuously developing because new advanced films with prescribed physical and functional properties are needed. This paper reports on duplex coatings, nanocomposite coatings, high-rate magnetron sputtering and self-sputtering, i.e. new advances in magnetronsputtering technology which are of great importance for future development of surface engineering. A great deal of attention is devoted to (i) the coating/substrate interface, (ii) the magnetron sputtering of nanostructured coatings with new properties due to small grains of about 10 nm and smaller and (iii) the replacement of ecologically damaging galvanic coating processes by high-rate magnetron sputtering and self sputtering.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

1999

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

02578972

e-ISSN

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Svazek periodika

Vol.^112

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

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Kód UT WoS článku

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EID výsledku v databázi Scopus

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