Cryogenic pulsed laser deposition of ZnO

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F12%3A43897330" target="_blank" >RIV/49777513:23640/12:43897330 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.vacuum.2011.07.033" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2011.07.033</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2011.07.033" target="_blank" >10.1016/j.vacuum.2011.07.033</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Cryogenic pulsed laser deposition of ZnO

Popis výsledku v původním jazyce

The paper deals with the pulsed laser deposition technology and in this special case the substrate was cooled at cryogenic temperature by liquid nitrogen during the deposition process. This approach is proper for growth of highly disordered structures with new physical properties and zinc oxide was applied as experimental example for demonstration. Films were deposited on different substrates: Si (100) and sapphire (0001) and subsequently annealed at different temperatures (200-800 °C). Their propertieswere investigated by various analytical methods. X-ray diffraction (XRD) proved fully amorphous structure of as-grown ZnO layers which were cooled during the deposition process. Annealing of these amorphous layers changed their properties according to temperature level and annealing time. XRD and scanning electron microscopy (SEM) revealed recrystallized structure.

Název v anglickém jazyce

Cryogenic pulsed laser deposition of ZnO

Popis výsledku anglicky

The paper deals with the pulsed laser deposition technology and in this special case the substrate was cooled at cryogenic temperature by liquid nitrogen during the deposition process. This approach is proper for growth of highly disordered structures with new physical properties and zinc oxide was applied as experimental example for demonstration. Films were deposited on different substrates: Si (100) and sapphire (0001) and subsequently annealed at different temperatures (200-800 °C). Their propertieswere investigated by various analytical methods. X-ray diffraction (XRD) proved fully amorphous structure of as-grown ZnO layers which were cooled during the deposition process. Annealing of these amorphous layers changed their properties according to temperature level and annealing time. XRD and scanning electron microscopy (SEM) revealed recrystallized structure.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

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Svazek periodika

86

Číslo periodika v rámci svazku

6

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

5

Strana od-do

684-688

Kód UT WoS článku

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EID výsledku v databázi Scopus

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