Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60162694%3AG43__%2F19%3A00555326" target="_blank" >RIV/60162694:G43__/19:00555326 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216224:14310/19:00112003 RIV/00216275:25310/19:39914959

Výsledek na webu

<a href="https://doi.org/10.1016/j.tsf.2019.03.001" target="_blank" >https://doi.org/10.1016/j.tsf.2019.03.001</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2019.03.001" target="_blank" >10.1016/j.tsf.2019.03.001</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model

Popis výsledku v původním jazyce

A multiple-beam interference model is used to derive approximate formulae for the reflection and transmission coefficients of inhomogeneous thin films exhibiting large gradients of refractive index profiles. It is shown that these formulae are constituted by series containing the Wentzel-Kramers-Brillouin-Jeffreys term and correction terms with increasing order corresponding to number of considered internal reflections inside the films. A numerical analysis enabling us to show the influence of a degree of inhomogeneity on spectral dependencies of reflectance and ellipsometric parameters of inhomogeneous films is performed. Advantages and disadvantages of our approach compared with other approximate approaches are discussed. The optical characterization of a selected non-stoichiometric silicon nitride film prepared by reactive magnetron sputtering onto silicon single crystal substrate is performed for illustration of using our formulae in practice.

Název v anglickém jazyce

Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model

Popis výsledku anglicky

A multiple-beam interference model is used to derive approximate formulae for the reflection and transmission coefficients of inhomogeneous thin films exhibiting large gradients of refractive index profiles. It is shown that these formulae are constituted by series containing the Wentzel-Kramers-Brillouin-Jeffreys term and correction terms with increasing order corresponding to number of considered internal reflections inside the films. A numerical analysis enabling us to show the influence of a degree of inhomogeneity on spectral dependencies of reflectance and ellipsometric parameters of inhomogeneous films is performed. Advantages and disadvantages of our approach compared with other approximate approaches are discussed. The optical characterization of a selected non-stoichiometric silicon nitride film prepared by reactive magnetron sputtering onto silicon single crystal substrate is performed for illustration of using our formulae in practice.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10300 - Physical sciences

Projekt

<a href="/cs/project/LO1411" target="_blank" >LO1411: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

692

Číslo periodika v rámci svazku

December 2019

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

17

Strana od-do

1-17

Kód UT WoS článku

000499678700004

EID výsledku v databázi Scopus

2-s2.0-85071177245