Co3O4 thin films prepared by hollow cathode discharge

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F19%3A43934069" target="_blank" >RIV/60461373:22310/19:43934069 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/19:00520354 RIV/61388955:_____/19:00520354

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0257897219302634?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0257897219302634?via%3Dihub</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2019.03.010" target="_blank" >10.1016/j.surfcoat.2019.03.010</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Co3O4 thin films prepared by hollow cathode discharge

Popis výsledku v původním jazyce

Semiconducting crystalline Co3O4 thin films were deposited on glass, stainless steel and Si substrates using three different PVD methods: (i) RF magnetron sputtering, (ii) high-power impulse magnetron sputtering (HiPIMS), and (iii) hollow cathode discharge (HCD). All layers were sputtered from pure cobalt target (or nozzle) in reactive atmosphere and post-annealed on air. Properties of deposited layers have been studied and discussed with respect to their potential applications. The surface morphology of the films was analyzed by SEM, their crystalline structure by XRD and Raman spectroscopy, chemical composition by EDS, electrical properties by Van der Pauw method and the specific surface area was measured by standard BET analysis. The layers prepared by the hollow cathode discharge compared to the magnetron-prepared films exhibited higher porosity, higher resistivity, higher activation energy, and higher deposition rate during the sputtering process.

Název v anglickém jazyce

Co3O4 thin films prepared by hollow cathode discharge

Popis výsledku anglicky

Semiconducting crystalline Co3O4 thin films were deposited on glass, stainless steel and Si substrates using three different PVD methods: (i) RF magnetron sputtering, (ii) high-power impulse magnetron sputtering (HiPIMS), and (iii) hollow cathode discharge (HCD). All layers were sputtered from pure cobalt target (or nozzle) in reactive atmosphere and post-annealed on air. Properties of deposited layers have been studied and discussed with respect to their potential applications. The surface morphology of the films was analyzed by SEM, their crystalline structure by XRD and Raman spectroscopy, chemical composition by EDS, electrical properties by Van der Pauw method and the specific surface area was measured by standard BET analysis. The layers prepared by the hollow cathode discharge compared to the magnetron-prepared films exhibited higher porosity, higher resistivity, higher activation energy, and higher deposition rate during the sputtering process.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10300 - Physical sciences

Projekt

<a href="/cs/project/GA17-08389S" target="_blank" >GA17-08389S: Pokročilá příprava katalyticky aktivních oxidů na kovových nosičích s využitím plazmové depozice a chemických metod</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

SURFACE &amp; COATINGS TECHNOLOGY

ISSN

0257-8972

e-ISSN

—

Svazek periodika

366

Číslo periodika v rámci svazku

Neuveden

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

303-310

Kód UT WoS článku

000465366400035

EID výsledku v databázi Scopus

2-s2.0-85063460840