High-power pulsed plasma deposition of hematite photoanode for PEC water splitting

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00438772" target="_blank" >RIV/68378271:_____/14:00438772 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/14:33149300 RIV/60461373:22310/14:43896656

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.cattod.2013.11.045" target="_blank" >http://dx.doi.org/10.1016/j.cattod.2013.11.045</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.cattod.2013.11.045" target="_blank" >10.1016/j.cattod.2013.11.045</a>

Jazyk výsledku

angličtina

Název v původním jazyce

High-power pulsed plasma deposition of hematite photoanode for PEC water splitting

Popis výsledku v původním jazyce

The fabrication of crystalline Alpha-Fe2O3 hematite thin films by means of novel high power impulse magnetron sputtering (HiPIMS) and high power hollow cathode plasma jets system is reported. The coatings are based on low temperature pulsed-plasma reactive sputtering. These methods were compared with a more common method of medium frequency pulsed reactive DC magnetron sputtering. Although both high power methods yielded crystalline structure of the films already during the depositions, the films had tobe thermally treated at elevated temperature in order to improve their physical and electronic properties. The deposition methods used and the effect of the post deposition thermal annealing were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, electronic properties, and electrical behavior. The functional properties were investigated under simulated photoelectrochemical water splitting conditions.

Název v anglickém jazyce

High-power pulsed plasma deposition of hematite photoanode for PEC water splitting

Popis výsledku anglicky

The fabrication of crystalline Alpha-Fe2O3 hematite thin films by means of novel high power impulse magnetron sputtering (HiPIMS) and high power hollow cathode plasma jets system is reported. The coatings are based on low temperature pulsed-plasma reactive sputtering. These methods were compared with a more common method of medium frequency pulsed reactive DC magnetron sputtering. Although both high power methods yielded crystalline structure of the films already during the depositions, the films had tobe thermally treated at elevated temperature in order to improve their physical and electronic properties. The deposition methods used and the effect of the post deposition thermal annealing were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, electronic properties, and electrical behavior. The functional properties were investigated under simulated photoelectrochemical water splitting conditions.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Catalysis Today

ISSN

0920-5861

e-ISSN

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Svazek periodika

230

Číslo periodika v rámci svazku

Jul

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

8-14

Kód UT WoS článku

000333800300003

EID výsledku v databázi Scopus

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