Evaluation of local radiation damage in silicon sensor via charge collection mapping with the Timepix read-out chip
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F13%3A00392531" target="_blank" >RIV/61389005:_____/13:00392531 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/68407700:21670/13:00215465
Výsledek na webu
<a href="http://dx.doi.org/10.1088/1748-0221/8/04/C04001" target="_blank" >http://dx.doi.org/10.1088/1748-0221/8/04/C04001</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1748-0221/8/04/C04001" target="_blank" >10.1088/1748-0221/8/04/C04001</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Evaluation of local radiation damage in silicon sensor via charge collection mapping with the Timepix read-out chip
Popis výsledku v původním jazyce
Studies of radiation hardness of silicon sensors are standardly performed with single-pad detectors evaluating their global electrical properties. In this work we introduce a technique to visualize and determine the spatial distribution of radiation damage across the area of a semiconductor sensor. The sensor properties such as charge collection efficiency and charge diffusion were evaluated locally at many points of the sensor creating 2D maps. For this purpose we used a silicon sensor bump bonded to the pixelated Timepix read-out chip. This device, operated in Time-over-threshold (TOT) mode, allows for the direct energy measurement in each pixel. Selected regions of the sensor were intentionally damaged by defined doses (up to 10(12) particles/cm(2))of energetic protons (of 2.5 and 4 MeV). The extent of the damage was measured in terms of the detector response to the same ions. This procedure was performed either on-line during irradiation or off-line after it. The response of the d
Název v anglickém jazyce
Evaluation of local radiation damage in silicon sensor via charge collection mapping with the Timepix read-out chip
Popis výsledku anglicky
Studies of radiation hardness of silicon sensors are standardly performed with single-pad detectors evaluating their global electrical properties. In this work we introduce a technique to visualize and determine the spatial distribution of radiation damage across the area of a semiconductor sensor. The sensor properties such as charge collection efficiency and charge diffusion were evaluated locally at many points of the sensor creating 2D maps. For this purpose we used a silicon sensor bump bonded to the pixelated Timepix read-out chip. This device, operated in Time-over-threshold (TOT) mode, allows for the direct energy measurement in each pixel. Selected regions of the sensor were intentionally damaged by defined doses (up to 10(12) particles/cm(2))of energetic protons (of 2.5 and 4 MeV). The extent of the damage was measured in terms of the detector response to the same ions. This procedure was performed either on-line during irradiation or off-line after it. The response of the d
Klasifikace
Druh
J<sub>x</sub> - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
CEP obor
BG - Jaderná, atomová a molekulová fyzika, urychlovače
OECD FORD obor
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Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2013
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Journal of Instrumentation
ISSN
1748-0221
e-ISSN
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Svazek periodika
8
Číslo periodika v rámci svazku
April 2013
Stát vydavatele periodika
GB - Spojené království Velké Británie a Severního Irska
Počet stran výsledku
7
Strana od-do
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Kód UT WoS článku
000317462400001
EID výsledku v databázi Scopus
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