Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F25%3A00619585" target="_blank" >RIV/61389005:_____/25:00619585 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216305:26310/26:0198384 RIV/00216224:14310/25:00141901 RIV/44555601:13440/25:43899243

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0254058425005814" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0254058425005814</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.matchemphys.2025.130935" target="_blank" >10.1016/j.matchemphys.2025.130935</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years

Popis výsledku v původním jazyce

Nonthermal plasma-deposited glassy silica is often used as a gas barrier film to protect polymer material in many applications. This study revealed that glassy silica is a slightly porous material (3 vol%) with small pores (2.5 nm) formed during thin film deposition. The infrared spectrum shows that the as-deposited plasma silica contains gaseous carbon dioxide, which is likely encapsulated in the pores. It can be assumed that these CO2 molecules diffuse from the silica layer through the silicon oxide/polymer interface into the protected polymer material. The low crosslinked polymer material is then locally oxidized by CO2, which changes its chemical and physical properties. This means that the silicon oxide/polymer interface gradually moves into the polymer material over time. CO2 diffusion is therefore considered responsible for a shift of the silicon oxide/polymer interface by 30-35 nm after 27 months.

Název v anglickém jazyce

Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years

Popis výsledku anglicky

Nonthermal plasma-deposited glassy silica is often used as a gas barrier film to protect polymer material in many applications. This study revealed that glassy silica is a slightly porous material (3 vol%) with small pores (2.5 nm) formed during thin film deposition. The infrared spectrum shows that the as-deposited plasma silica contains gaseous carbon dioxide, which is likely encapsulated in the pores. It can be assumed that these CO2 molecules diffuse from the silica layer through the silicon oxide/polymer interface into the protected polymer material. The low crosslinked polymer material is then locally oxidized by CO2, which changes its chemical and physical properties. This means that the silicon oxide/polymer interface gradually moves into the polymer material over time. CO2 diffusion is therefore considered responsible for a shift of the silicon oxide/polymer interface by 30-35 nm after 27 months.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10304 - Nuclear physics

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Materials Chemistry and Physics

ISSN

0254-0584

e-ISSN

1879-3312

Svazek periodika

341

Číslo periodika v rámci svazku

September

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

9

Strana od-do

130935

Kód UT WoS článku

001482301000001

EID výsledku v databázi Scopus

2-s2.0-105003384451