Numerical investigation on the effect of gas-phase dynamics on graphene growth in chemical vapor deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27710%2F24%3A10254907" target="_blank" >RIV/61989100:27710/24:10254907 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.scopus.com/record/display.uri?eid=2-s2.0-85189108326&origin=resultslist&sort=plf-f&src=s&sid=7175291752deae787a74a342d018e9cb&sot=b&sdt=b&s=TITLE%28Numerical+investigation+on+the+effect+of+gas-phase+dynamics+on+graphene+growth+in+chemical+vapor+deposition%29&sl=114&sessionSearchId=7175291752deae787a74a342d018e9cb&relpos=0" target="_blank" >https://www.scopus.com/record/display.uri?eid=2-s2.0-85189108326&origin=resultslist&sort=plf-f&src=s&sid=7175291752deae787a74a342d018e9cb&sot=b&sdt=b&s=TITLE%28Numerical+investigation+on+the+effect+of+gas-phase+dynamics+on+graphene+growth+in+chemical+vapor+deposition%29&sl=114&sessionSearchId=7175291752deae787a74a342d018e9cb&relpos=0</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/5.0199471" target="_blank" >10.1063/5.0199471</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Numerical investigation on the effect of gas-phase dynamics on graphene growth in chemical vapor deposition

Popis výsledku v původním jazyce

Chemical vapor deposition (CVD) is a crucial technique to prepare high-quality graphene because of its controllability. In the research, we perform a systematic computational fluid dynamics numerical investigation on the effect of gas-phase reaction dynamics on the graphene growth in a horizontal tube CVD reactor. The research results indicate that the gas-phase chemical reactions in the CVD reactor are in a nonequilibrium state, as evidenced by the comparison of species mole fraction distributions during the CVD process and under chemical equilibrium conditions. The effect of gas-phase reaction dynamics on the deposition rate of graphene under different conditions is studied, and our research shows that the main causes of change in graphene growth rates under different conditions are gas-phase reaction dynamics and active species transport. The results of numerical simulation agree well with the experimental phenomena. The research results also indicate that, for methane, the main limiting factor of graphene growth is the surface kinetic reaction rate. Conversely, for active species, the main limiting factor of graphene growth is species transport. Our research suggests that the growth rate of graphene can be regulated from the perspective of the gas reaction mechanism. This method has theoretical guiding significance and can be extended to the preparation of large-area graphene. (C) 2024 Author(s).

Název v anglickém jazyce

Numerical investigation on the effect of gas-phase dynamics on graphene growth in chemical vapor deposition

Popis výsledku anglicky

Chemical vapor deposition (CVD) is a crucial technique to prepare high-quality graphene because of its controllability. In the research, we perform a systematic computational fluid dynamics numerical investigation on the effect of gas-phase reaction dynamics on the graphene growth in a horizontal tube CVD reactor. The research results indicate that the gas-phase chemical reactions in the CVD reactor are in a nonequilibrium state, as evidenced by the comparison of species mole fraction distributions during the CVD process and under chemical equilibrium conditions. The effect of gas-phase reaction dynamics on the deposition rate of graphene under different conditions is studied, and our research shows that the main causes of change in graphene growth rates under different conditions are gas-phase reaction dynamics and active species transport. The results of numerical simulation agree well with the experimental phenomena. The research results also indicate that, for methane, the main limiting factor of graphene growth is the surface kinetic reaction rate. Conversely, for active species, the main limiting factor of graphene growth is species transport. Our research suggests that the growth rate of graphene can be regulated from the perspective of the gas reaction mechanism. This method has theoretical guiding significance and can be extended to the preparation of large-area graphene. (C) 2024 Author(s).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

21000 - Nano-technology

Projekt

<a href="/cs/project/EF16_019%2F0000853" target="_blank" >EF16_019/0000853: Institut environmentálních technologií - excelentní výzkum</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of applied physics

ISSN

0021-8979

e-ISSN

1089-7550

Svazek periodika

135

Číslo periodika v rámci svazku

12

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

10

Strana od-do

—

Kód UT WoS článku

001198399100012

EID výsledku v databázi Scopus

2-s2.0-85189108326