Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F09%3A00335019" target="_blank" >RIV/68378271:_____/09:00335019 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21340/09:00164553

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

Popis výsledku v původním jazyce

The pulsed DC magnetron and hollow-cathode plasma jet sources have been studied from the point of view of total energy flux density at a floating?? substrate. Both plasma sources were operated under identical experimental conditions and differences between both systems were investigated. The aim of this work is focused on the characterization of total power density at electrically isolated substrate for various duty cycles and for different pulsing frequencies. A calorimeter probe with incorporated thermocouple junction was used for measurement of the total power density on the substrate. The main results from the calorimeter probe show clearly that total power density at the substrate is much higher for the planar magnetron operating at low duty cycleand high pulsing frequency than for the plasma jet. The total power density measured in the planar magnetron depends more strongly on the duty cycle and the pulsing frequency than measured in the plasma jet.

Název v anglickém jazyce

Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

Popis výsledku anglicky

The pulsed DC magnetron and hollow-cathode plasma jet sources have been studied from the point of view of total energy flux density at a floating?? substrate. Both plasma sources were operated under identical experimental conditions and differences between both systems were investigated. The aim of this work is focused on the characterization of total power density at electrically isolated substrate for various duty cycles and for different pulsing frequencies. A calorimeter probe with incorporated thermocouple junction was used for measurement of the total power density on the substrate. The main results from the calorimeter probe show clearly that total power density at the substrate is much higher for the planar magnetron operating at low duty cycleand high pulsing frequency than for the plasma jet. The total power density measured in the planar magnetron depends more strongly on the duty cycle and the pulsing frequency than measured in the plasma jet.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2009

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

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Svazek periodika

6

Číslo periodika v rámci svazku

S1

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

6

Strana od-do

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Kód UT WoS článku

000272302900050

EID výsledku v databázi Scopus

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