Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00438450" target="_blank" >RIV/68378271:_____/11:00438450 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.msec.2011.06.009" target="_blank" >http://dx.doi.org/10.1016/j.msec.2011.06.009</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.msec.2011.06.009" target="_blank" >10.1016/j.msec.2011.06.009</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

Popis výsledku v původním jazyce

The antibacterial effect of thin titanium-copper (Ti-Cu) films combined with sufficient growth of human osteoblastic cells is reported in the paper. Thin Ti-Cu films were prepared by three different plasma-assisted magnetron sputtering methods: direct current magnetron sputtering (dc-MS), dual magnetron sputtering (dual-MS) as well as dual high power impulse magnetron sputtering (dual-HiPIMS). The antimicrobial effect is caused by copper released from the metallic Ti-Cu films, which was measured by atomic absorption spectroscopy (AAS). The copper release is influenced by the chemical and physical properties of the deposited films and was investigated by X-ray diffractometry and X-ray reflectometry (GIXD and XR) techniques. It was found that, within thefirst 24 h the amount of Cu released from dual-HiPIMS films (about 250 mu g) was much higher than from dc-MS and dual-MS films. In vitro planktonic growth tests on Ti-Cu surfaces for Staphylococcus epidermidis and S. aureus demonstrated

Název v anglickém jazyce

Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

Popis výsledku anglicky

The antibacterial effect of thin titanium-copper (Ti-Cu) films combined with sufficient growth of human osteoblastic cells is reported in the paper. Thin Ti-Cu films were prepared by three different plasma-assisted magnetron sputtering methods: direct current magnetron sputtering (dc-MS), dual magnetron sputtering (dual-MS) as well as dual high power impulse magnetron sputtering (dual-HiPIMS). The antimicrobial effect is caused by copper released from the metallic Ti-Cu films, which was measured by atomic absorption spectroscopy (AAS). The copper release is influenced by the chemical and physical properties of the deposited films and was investigated by X-ray diffractometry and X-ray reflectometry (GIXD and XR) techniques. It was found that, within thefirst 24 h the amount of Cu released from dual-HiPIMS films (about 250 mu g) was much higher than from dc-MS and dual-MS films. In vitro planktonic growth tests on Ti-Cu surfaces for Staphylococcus epidermidis and S. aureus demonstrated

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Materials Science & Engineering C-Materials for Biological Applications

ISSN

0928-4931

e-ISSN

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Svazek periodika

31

Číslo periodika v rámci svazku

7

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

1512-1519

Kód UT WoS článku

000295953900038

EID výsledku v databázi Scopus

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