RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F13%3A00396058" target="_blank" >RIV/68378271:_____/13:00396058 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2012.05.024" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2012.05.024</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2012.05.024" target="_blank" >10.1016/j.surfcoat.2012.05.024</a>

Jazyk výsledku

angličtina

Název v původním jazyce

RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology

Popis výsledku v původním jazyce

We have carried out a systematic study of the influence of Ne, Ar and Kr working gases on both plasma and film properties of RF magnetron sputtering of silver. The magnetron plasma was characterised by optical emission spectroscopy (OES) and mass spectrometry. Silver thin film morphology was examined by SEM and AFM. We studied influence of magnetron power and working gas pressure on the plasma composition. The magnetron power was varied from 25 to 100 W. The ambient pressure was changed from 0.5 Pa to 3Pa. Both mass and OES spectra revealed presence of highly excited plasma in the substrate vicinity for all sputtering gases. The increasing OES signal intensities of Ag and Ag+ with increasing RF power and gas pressure were observed. However, in Ar discharge there was no Ag+ signal detected by OES at lower pressures of 0.5 Pa and 1 Pa. Similar profiles of the energy distributions of the ions with a maximum located around.

Název v anglickém jazyce

RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges-plasma characterisation and surface morphology

Popis výsledku anglicky

We have carried out a systematic study of the influence of Ne, Ar and Kr working gases on both plasma and film properties of RF magnetron sputtering of silver. The magnetron plasma was characterised by optical emission spectroscopy (OES) and mass spectrometry. Silver thin film morphology was examined by SEM and AFM. We studied influence of magnetron power and working gas pressure on the plasma composition. The magnetron power was varied from 25 to 100 W. The ambient pressure was changed from 0.5 Pa to 3Pa. Both mass and OES spectra revealed presence of highly excited plasma in the substrate vicinity for all sputtering gases. The increasing OES signal intensities of Ag and Ag+ with increasing RF power and gas pressure were observed. However, in Ar discharge there was no Ag+ signal detected by OES at lower pressures of 0.5 Pa and 1 Pa. Similar profiles of the energy distributions of the ions with a maximum located around.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

228

Číslo periodika v rámci svazku

Suppl. 1

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

4

Strana od-do

"S466?S469"

Kód UT WoS článku

000323628400102

EID výsledku v databázi Scopus

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