Large area deposition of boron doped nano-crystalline diamond films at low temperatures using microwave plasma enhanced chemical vapour deposition with linear antenna delivery

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00431502" target="_blank" >RIV/68378271:_____/14:00431502 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61389005:_____/14:00431502 RIV/00216275:25310/14:39897654

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.diamond.2014.05.002" target="_blank" >http://dx.doi.org/10.1016/j.diamond.2014.05.002</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.diamond.2014.05.002" target="_blank" >10.1016/j.diamond.2014.05.002</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Large area deposition of boron doped nano-crystalline diamond films at low temperatures using microwave plasma enhanced chemical vapour deposition with linear antenna delivery

Popis výsledku v původním jazyce

We report on the preparation and characterisation of boron (B) doped nano-crystalline diamond (BNCD) layers grown over large areas (up to 50cm x 30cm) and at low substrate temperatures (<650°C) using microwave plasma enhanced chemical vapour deposition apparatus with linear antenna delivery apparatus (MW-LA-PECVD). B-NCD layers were grown in H2/CH4/CO2 and H2/CH4 gas mixtures with added trimethylboron (TMB). Layers with thicknesses of 150nm to 1?m have been prepared with B/C ratios up to 15000ppm over arange of CO2/CH4 ratios to study the effect of oxygen (O) on the incorporation rate of B into the solid phase and the effect on the quality of the BNCD with respect to sp3/sp2 ratio. Experimental results show the reduction of boron acceptor concentration with increasing CO2 concentration. Higher sp3/sp2 ratios were measured by Raman spectroscopy with increasing TMB concentration in the gas phase without CO2.

Název v anglickém jazyce

Large area deposition of boron doped nano-crystalline diamond films at low temperatures using microwave plasma enhanced chemical vapour deposition with linear antenna delivery

Popis výsledku anglicky

We report on the preparation and characterisation of boron (B) doped nano-crystalline diamond (BNCD) layers grown over large areas (up to 50cm x 30cm) and at low substrate temperatures (<650°C) using microwave plasma enhanced chemical vapour deposition apparatus with linear antenna delivery apparatus (MW-LA-PECVD). B-NCD layers were grown in H2/CH4/CO2 and H2/CH4 gas mixtures with added trimethylboron (TMB). Layers with thicknesses of 150nm to 1?m have been prepared with B/C ratios up to 15000ppm over arange of CO2/CH4 ratios to study the effect of oxygen (O) on the incorporation rate of B into the solid phase and the effect on the quality of the BNCD with respect to sp3/sp2 ratio. Experimental results show the reduction of boron acceptor concentration with increasing CO2 concentration. Higher sp3/sp2 ratios were measured by Raman spectroscopy with increasing TMB concentration in the gas phase without CO2.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Diamond and Related Materials

ISSN

0925-9635

e-ISSN

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Svazek periodika

47

Číslo periodika v rámci svazku

AUG

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

27-34

Kód UT WoS článku

000340318100004

EID výsledku v databázi Scopus

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