Influence of surface wave plasma deposition conditions on diamond growth regime

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00448962" target="_blank" >RIV/68378271:_____/15:00448962 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21340/15:00242982

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.01.012" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2015.01.012</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.01.012" target="_blank" >10.1016/j.surfcoat.2015.01.012</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Influence of surface wave plasma deposition conditions on diamond growth regime

Popis výsledku v původním jazyce

The influence of deposition conditions on the diamond thin film growth in linear antenna microwave plasma system, also known as surface wave plasma reactor, is presented in this study. Depending on the process pressure the two growth regimes were identified. At high pressures (over 50 Pa) dominates the re-nucleation regime that results in ultra-small diamond crystals, while at low pressures (below 10 Pa) dominates the lateral growth regime that leads to formation of large diamond crystals. Next, it wasshown that the distance of substrates from ?hot plasma region influences the diamond growth kinetics and results in growth regimes shift. Altogether, the observed results contribute to a better understanding of the diamond growth phenomena in surface wave plasma systems. Thus, it allows controllable growth of diamond films with tailored properties (morphology, roughness, etc).

Název v anglickém jazyce

Influence of surface wave plasma deposition conditions on diamond growth regime

Popis výsledku anglicky

The influence of deposition conditions on the diamond thin film growth in linear antenna microwave plasma system, also known as surface wave plasma reactor, is presented in this study. Depending on the process pressure the two growth regimes were identified. At high pressures (over 50 Pa) dominates the re-nucleation regime that results in ultra-small diamond crystals, while at low pressures (below 10 Pa) dominates the lateral growth regime that leads to formation of large diamond crystals. Next, it wasshown that the distance of substrates from ?hot plasma region influences the diamond growth kinetics and results in growth regimes shift. Altogether, the observed results contribute to a better understanding of the diamond growth phenomena in surface wave plasma systems. Thus, it allows controllable growth of diamond films with tailored properties (morphology, roughness, etc).

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

—

Projekt

<a href="/cs/project/GA14-05053S" target="_blank" >GA14-05053S: Příprava a vlastnosti nanokrystalického diamantu pro fotonické aplikace</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

271

Číslo periodika v rámci svazku

Jun

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

6

Strana od-do

74-79

Kód UT WoS článku

000355349800013

EID výsledku v databázi Scopus

2-s2.0-84928547660