Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00449520" target="_blank" >RIV/68378271:_____/15:00449520 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035018" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/3/035018</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035018" target="_blank" >10.1088/0963-0252/24/3/035018</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

Popis výsledku v původním jazyce

The ionization of sputtered Ti, Al, and C has been investigated in non-reactive high-power impulse magnetron sputtering discharges using Ar as a process gas. Two complementary techniques, time-resolved Langmuir probe diagnostics and a recently developedgridless ion meter, have for the first time been used to estimate absolute values of the ionized fractions of the sputtered material. It is found that by increasing the current density from 0.5 to 2.0 A cm2 there is a general increase of ne independentlyof target material and position in time with maximum plasma densities of about 1 1018?5 1018 m3 above the target race track. Also the ionized flux fraction, measured by ion meter, is increased when increasing the current density and reaches a maximum value of 78% in the Al discharge. By using the recorded ne and Te values to calculate the ionization probability of the sputtered material, and benchmark these results using the ion meter.

Název v anglickém jazyce

Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

Popis výsledku anglicky

The ionization of sputtered Ti, Al, and C has been investigated in non-reactive high-power impulse magnetron sputtering discharges using Ar as a process gas. Two complementary techniques, time-resolved Langmuir probe diagnostics and a recently developedgridless ion meter, have for the first time been used to estimate absolute values of the ionized fractions of the sputtered material. It is found that by increasing the current density from 0.5 to 2.0 A cm2 there is a general increase of ne independentlyof target material and position in time with maximum plasma densities of about 1 1018?5 1018 m3 above the target race track. Also the ionized flux fraction, measured by ion meter, is increased when increasing the current density and reaches a maximum value of 78% in the Al discharge. By using the recorded ne and Te values to calculate the ionization probability of the sputtered material, and benchmark these results using the ion meter.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/LH12043" target="_blank" >LH12043: Výzkum tenkých vrstev na bázi FeS2 pro fotonické aplikace</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science & Technology

ISSN

0963-0252

e-ISSN

—

Svazek periodika

24

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

11

Strana od-do

—

Kód UT WoS článku

000356857800043

EID výsledku v databázi Scopus

2-s2.0-84937554357