Complex nano-patterning of structural, optical, electrical and electron emission properties of amorphous silicon thin films by scanning probe

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F18%3A00487144" target="_blank" >RIV/68378271:_____/18:00487144 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21230/18:00313894

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apsusc.2017.09.228" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2017.09.228</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2017.09.228" target="_blank" >10.1016/j.apsusc.2017.09.228</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Complex nano-patterning of structural, optical, electrical and electron emission properties of amorphous silicon thin films by scanning probe

Popis výsledku v původním jazyce

Preparation of nanoscale templates represents an important step for synthesis and assembly of diverse nanostructures and nanoscale devices. We show that complex nano-structural templates in a thin (40 nm) layer of hydrogenated amorphous silicon (a-Si:H) can be prepared by using locally applied electric field in an atomic force microscope (AFM). Depth of the resulting structures (1-40 nm) can be controlled by the process parameters (magnitude of electric field, exposure time, or nano-sweeping of the tip). We demonstrate that complex patterns can be scribed into the a-Si:H layer in that way. The prepared patterns exhibit different structural, optical, electrical, and electron emission properties, compared to the surroundings as detected by Raman micro-spectroscopy, scanning electron microscopy (SEM), and conductive AFM. The silicon thin films with locally modified properties can be useful in themselves or can serve as templates for further nanoscale growth or assembly.n

Název v anglickém jazyce

Complex nano-patterning of structural, optical, electrical and electron emission properties of amorphous silicon thin films by scanning probe

Popis výsledku anglicky

Preparation of nanoscale templates represents an important step for synthesis and assembly of diverse nanostructures and nanoscale devices. We show that complex nano-structural templates in a thin (40 nm) layer of hydrogenated amorphous silicon (a-Si:H) can be prepared by using locally applied electric field in an atomic force microscope (AFM). Depth of the resulting structures (1-40 nm) can be controlled by the process parameters (magnitude of electric field, exposure time, or nano-sweeping of the tip). We demonstrate that complex patterns can be scribed into the a-Si:H layer in that way. The prepared patterns exhibit different structural, optical, electrical, and electron emission properties, compared to the surroundings as detected by Raman micro-spectroscopy, scanning electron microscopy (SEM), and conductive AFM. The silicon thin films with locally modified properties can be useful in themselves or can serve as templates for further nanoscale growth or assembly.n

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

—

Svazek periodika

428

Číslo periodika v rámci svazku

Jan

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

1159-1165

Kód UT WoS článku

000415227000145

EID výsledku v databázi Scopus

2-s2.0-85030834366