Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F24%3A00601376" target="_blank" >RIV/68378271:_____/24:00601376 - isvavai.cz</a>

Výsledek na webu

<a href="https://hdl.handle.net/11104/0358543" target="_blank" >https://hdl.handle.net/11104/0358543</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ad8dfa" target="_blank" >10.1088/1361-6595/ad8dfa</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture

Popis výsledku v původním jazyce

The energy distribution of negatively and positively charged ions in a magnetron discharge with a positively biased anode is investigated. A tungsten cathode operated in an argon/oxygen gas mixture is employed. The magnetron is operated either in direct current magnetron sputtering or in high power impulse magnetron sputtering mode. Positively charged atomic O+, Ar+, and W+ ions, molecular O+2 , ArO+, Ar+2 , WO+, WO+2 , and WO+3 , and doubly charged Ar2+, W2+ and WO2+ ions are observed. Negatively charged O−, O− 2 , W−, WO−, WO− 2 , and WO− 3 ions form inside the plasma volume by electron attachment reactions. In addition, a small part of the negatively charged ions is sputtered directly from the negatively biased cathode and observed at high kinetic energies corresponding to the cathode potential.n

Název v anglickém jazyce

Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture

Popis výsledku anglicky

The energy distribution of negatively and positively charged ions in a magnetron discharge with a positively biased anode is investigated. A tungsten cathode operated in an argon/oxygen gas mixture is employed. The magnetron is operated either in direct current magnetron sputtering or in high power impulse magnetron sputtering mode. Positively charged atomic O+, Ar+, and W+ ions, molecular O+2 , ArO+, Ar+2 , WO+, WO+2 , and WO+3 , and doubly charged Ar2+, W2+ and WO2+ ions are observed. Negatively charged O−, O− 2 , W−, WO−, WO− 2 , and WO− 3 ions form inside the plasma volume by electron attachment reactions. In addition, a small part of the negatively charged ions is sputtered directly from the negatively biased cathode and observed at high kinetic energies corresponding to the cathode potential.n

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/EH22_008%2F0004596" target="_blank" >EH22_008/0004596: Senzory a detektory pro informační společnost budoucnosti</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science & Technology

ISSN

0963-0252

e-ISSN

1361-6595

Svazek periodika

33

Číslo periodika v rámci svazku

11

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

12

Strana od-do

115006

Kód UT WoS článku

001353747600001

EID výsledku v databázi Scopus

2-s2.0-85209874878