Comprehensive behavioral model of dual-gate high voltage JFET and pinch resistor
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F16%3A00300815" target="_blank" >RIV/68407700:21230/16:00300815 - isvavai.cz</a>
Výsledek na webu
<a href="http://www.sciencedirect.com/science/article/pii/S0038110116300326" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0038110116300326</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.sse.2016.05.001" target="_blank" >10.1016/j.sse.2016.05.001</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Comprehensive behavioral model of dual-gate high voltage JFET and pinch resistor
Popis výsledku v původním jazyce
Many analog technologies operate in large voltage range and therefore include at least one or more high voltage devices built from low doped layers. Such devices exhibit effects not covered by standard compact models, namely pinching (depletion) effects, in high voltage FETs often called quasisaturation. For example, the conventional compact JFET model is insufficient and oversimplified. Its scalability is controlled by the area factor, which only multiplies currents and capacitances but does not take into account existing 3-D effects. Also the optional second independent gate is missing. Therefore, the customized four terminal (4T) model written in Verilog-A (FitzPatrick and Miller, 2007; Sagdeo, 2007) was developed. It converges very well, its simulation speed is comparable with conventional compact models, and contains all required phenomena, including parasitic effects as, for example, impact ionization. This model has universal usage for many types of devices in various high voltage technologies such as stand-alone voltage dependent resistor, pinch resistor, drift area of power FET, part of special high side or start-up devices, and dual-gate JFET.
Název v anglickém jazyce
Comprehensive behavioral model of dual-gate high voltage JFET and pinch resistor
Popis výsledku anglicky
Many analog technologies operate in large voltage range and therefore include at least one or more high voltage devices built from low doped layers. Such devices exhibit effects not covered by standard compact models, namely pinching (depletion) effects, in high voltage FETs often called quasisaturation. For example, the conventional compact JFET model is insufficient and oversimplified. Its scalability is controlled by the area factor, which only multiplies currents and capacitances but does not take into account existing 3-D effects. Also the optional second independent gate is missing. Therefore, the customized four terminal (4T) model written in Verilog-A (FitzPatrick and Miller, 2007; Sagdeo, 2007) was developed. It converges very well, its simulation speed is comparable with conventional compact models, and contains all required phenomena, including parasitic effects as, for example, impact ionization. This model has universal usage for many types of devices in various high voltage technologies such as stand-alone voltage dependent resistor, pinch resistor, drift area of power FET, part of special high side or start-up devices, and dual-gate JFET.
Klasifikace
Druh
J<sub>x</sub> - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
CEP obor
JA - Elektronika a optoelektronika, elektrotechnika
OECD FORD obor
—
Návaznosti výsledku
Projekt
<a href="/cs/project/TE01020186" target="_blank" >TE01020186: Centrum integrovaných družicových a pozemských navigačních technologií</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2016
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Solid-State Electronics
ISSN
0038-1101
e-ISSN
—
Svazek periodika
123
Číslo periodika v rámci svazku
9
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
10
Strana od-do
133-142
Kód UT WoS článku
000379785900023
EID výsledku v databázi Scopus
2-s2.0-84969543350