Total Irradiation Dose Effects on 4H-SiC Power Devices
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F18%3A00322919" target="_blank" >RIV/68407700:21230/18:00322919 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Total Irradiation Dose Effects on 4H-SiC Power Devices
Popis výsledku v původním jazyce
The effect of neutron, electron and proton irradiation on electrical characteristics of different SiC power devices (JBS and PiN diodes, JFETs and MOSFETs) was investigated. DLTS investigation showed that above mentioned projectiles introduce similar deep acceptor levels (electron traps) in the SiC bandgap which compensate shallow donors, decrease carrier mobility and lifetime. The key degradation effect occurring in unipolar devices is the increase of the ON-state resistance which is caused by the compensation of the low doped n-type drift region and simultaneous lowering of electron mobility. In bipolar devices, high introduction rates of lifetime killing defects (the Z1/Z2 centers) cause a sharp reduction of carrier lifetime. This results in shorter carrier diffusion lengths and subsequent loss of conductivity modulation in the ON state leading to a sharp increase of the forward voltage drop. In the case of SiC power switches (JFET, MOSFET), these effects are accompanied by the shift of the threshold voltage. This effect is critical for MOSFETs since they contain the charge sensitive oxide layer. According to our study, the JBS diode and JFET can be considered the most radiation resistant devices.
Název v anglickém jazyce
Total Irradiation Dose Effects on 4H-SiC Power Devices
Popis výsledku anglicky
The effect of neutron, electron and proton irradiation on electrical characteristics of different SiC power devices (JBS and PiN diodes, JFETs and MOSFETs) was investigated. DLTS investigation showed that above mentioned projectiles introduce similar deep acceptor levels (electron traps) in the SiC bandgap which compensate shallow donors, decrease carrier mobility and lifetime. The key degradation effect occurring in unipolar devices is the increase of the ON-state resistance which is caused by the compensation of the low doped n-type drift region and simultaneous lowering of electron mobility. In bipolar devices, high introduction rates of lifetime killing defects (the Z1/Z2 centers) cause a sharp reduction of carrier lifetime. This results in shorter carrier diffusion lengths and subsequent loss of conductivity modulation in the ON state leading to a sharp increase of the forward voltage drop. In the case of SiC power switches (JFET, MOSFET), these effects are accompanied by the shift of the threshold voltage. This effect is critical for MOSFETs since they contain the charge sensitive oxide layer. According to our study, the JBS diode and JFET can be considered the most radiation resistant devices.
Klasifikace
Druh
D - Stať ve sborníku
CEP obor
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OECD FORD obor
20201 - Electrical and electronic engineering
Návaznosti výsledku
Projekt
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Návaznosti
S - Specificky vyzkum na vysokych skolach
Ostatní
Rok uplatnění
2018
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název statě ve sborníku
ISPS'18 Proceedings
ISBN
978-80-01-06469-6
ISSN
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e-ISSN
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Počet stran výsledku
7
Strana od-do
85-91
Název nakladatele
Česká technika - nakladatelství ČVUT
Místo vydání
Praha
Místo konání akce
Praha
Datum konání akce
29. 8. 2018
Typ akce podle státní příslušnosti
WRD - Celosvětová akce
Kód UT WoS článku
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