Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F20%3A00343445" target="_blank" >RIV/68407700:21230/20:00343445 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2020.125996" target="_blank" >https://doi.org/10.1016/j.surfcoat.2020.125996</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2020.125996" target="_blank" >10.1016/j.surfcoat.2020.125996</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment

Popis výsledku v původním jazyce

Nanocomposite Ti-Si-N thin films have been extensively studied for more than two decades mainly for the production of super hard materials. However, recently, several authors have shown that the use of HiPIMS in Ti-Si-N deposition bring about new opportunities for optimization of the films properties. HiPIMS allows for markedly different film growth pathways depending on the deposition conditions. In a previous work, regarding the deposition of Ti-Si-N films by DOMS (Deep Oscillation Magnetron Sputtering), authors also showed that, at low peak power, a unique optimal compromise of ionization fraction and energy of the sputtered species can be achieved. The main objective of the present work is to further investigate the low peak power regime in the deposition of Ti-Si-N films by DOMS. For this purpose, Ti-Si-N films with a Si content of 7 at.% were deposited by DOMS using a similar configuration as in our previous work but with fewer Si pellets placed on the Ti target in order to achieve a lower Si content.

Název v anglickém jazyce

Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment

Popis výsledku anglicky

Nanocomposite Ti-Si-N thin films have been extensively studied for more than two decades mainly for the production of super hard materials. However, recently, several authors have shown that the use of HiPIMS in Ti-Si-N deposition bring about new opportunities for optimization of the films properties. HiPIMS allows for markedly different film growth pathways depending on the deposition conditions. In a previous work, regarding the deposition of Ti-Si-N films by DOMS (Deep Oscillation Magnetron Sputtering), authors also showed that, at low peak power, a unique optimal compromise of ionization fraction and energy of the sputtered species can be achieved. The main objective of the present work is to further investigate the low peak power regime in the deposition of Ti-Si-N films by DOMS. For this purpose, Ti-Si-N films with a Si content of 7 at.% were deposited by DOMS using a similar configuration as in our previous work but with fewer Si pellets placed on the Ti target in order to achieve a lower Si content.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/EF18_070%2F0010457" target="_blank" >EF18_070/0010457: Mezinárodní mobility výzkumných pracovníků MSCA-IF II na ČVUT v Praze</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

397

Číslo periodika v rámci svazku

September

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

12

Strana od-do

—

Kód UT WoS článku

000543496400029

EID výsledku v databázi Scopus

2-s2.0-85085840337