A non-stationary model for high power impulse magnetron sputtering discharges

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F11%3A43898486" target="_blank" >RIV/49777513:23520/11:43898486 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.3656446" target="_blank" >http://dx.doi.org/10.1063/1.3656446</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.3656446" target="_blank" >10.1063/1.3656446</a>

Jazyk výsledku

angličtina

Název v původním jazyce

A non-stationary model for high power impulse magnetron sputtering discharges

Popis výsledku v původním jazyce

We present a non-stationary model proposed for high power impulse magnetron sputtering discharges, which is based on a global description of the plasma processes. The model takes into account a typical structure of magnetron discharges by dividing the plasma volume into two zones, the magnetically confined high-density zone above the target racetrack and the bulk plasma zone, where the transport of particles onto the substrate and the chamber walls dominates. The comparisons of the calculated data withmeasured results for distinct experimental conditions in two different high power impulse magnetron sputtering systems show a good agreement, suggesting that all relevant plasma processes were correctly incorporated into the model equations. The model can be used to gain a more detailed insight into the complicated processes in such types of discharges and to predict the influence of various process parameters on the deposition characteristics.

Název v anglickém jazyce

A non-stationary model for high power impulse magnetron sputtering discharges

Popis výsledku anglicky

We present a non-stationary model proposed for high power impulse magnetron sputtering discharges, which is based on a global description of the plasma processes. The model takes into account a typical structure of magnetron discharges by dividing the plasma volume into two zones, the magnetically confined high-density zone above the target racetrack and the bulk plasma zone, where the transport of particles onto the substrate and the chamber walls dominates. The comparisons of the calculated data withmeasured results for distinct experimental conditions in two different high power impulse magnetron sputtering systems show a good agreement, suggesting that all relevant plasma processes were correctly incorporated into the model equations. The model can be used to gain a more detailed insight into the complicated processes in such types of discharges and to predict the influence of various process parameters on the deposition characteristics.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/OC10045" target="_blank" >OC10045: Nové plazmové zdroje pro depozici vrstev a modifikaci povrchů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

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Svazek periodika

2011

Číslo periodika v rámci svazku

110

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

11

Strana od-do

1033031-10330311

Kód UT WoS článku

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EID výsledku v databázi Scopus

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